Foundry wafer manufacturing, EUV/DUV lithography, GAAFET/Nanosheet sub-3nm process integration, thin-film deposition, plasma etch, metrology, and wafer yield control.
Sub-3nm/2nm advanced process nodes, Extreme Ultraviolet (EUV / High-NA EUV) lithography, Gate-All-Around (GAAFET/Nanosheet) transistors, Backside Power Delivery (BSPDN), and defect-driven wafer yield optimization.
EUV lithography scanners, atomic layer deposition (ALD), high-density plasma etch, chemical-mechanical planarization (CMP), and optical/e-beam wafer defect inspection & CD-SEM metrology systems.